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      Tantalum
      

                    
                    
      
                        
        
                          
      • Tantalum sputtering target
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                            Tantalum sputtering target                        
      
                    
        
                               
                    
                    
      
                	
      Tantalum sputtering target
      
                            
        
                                
      • Material: R05200
        • 
                                
      • Purity: ≥99.95%, ≥99.99%
        • 
                                
      • Dimension: Customization
        • 
                                
      • Standard: ASTM B708-2012
        • 
                                
      • Application:  Used for optical fiber, semiconductor wafer and integrated circuit of sputtering deposition coating. Used for glass, ceramic, LCD coating. Used for the cathode sputtering coating, high vacuum suction 
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	Material: R05200

      

      
	Purity: ≥99.95%,
≥99.99%

      

      
	Dimension: Customization

      

      
	Standard:
ASTM B708-2012

      
Application: Used for
optical fiber, semiconductor wafer and integrated circuit of sputtering
deposition coating. Used for glass, ceramic, LCD coating. Used for the cathode
sputtering coating, high vacuum suction active material etc.                    
      

                   

                
      
                      
                
            
      


            
		  
		  
        
      
    
       
    
    






    
  
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